Epitaxial furnace and matching epitaxial technology are the highest stage of the industrial chain, with the highest technical threshold, the highest input risk and the highest return efficiency. It is the main battlefield that determines the subsequent improvement of luminous efficiency. The new epitaxial furnace is the key to the future breakthrough, and it is the main link that determines the subsequent cost reduction. The cost-effective special epitaxial furnace is the future development trend.
The global demand for epitaxial furnaces will increase by 30%~50% every year. In 2011, the number of epitaxial furnaces required to produce epitaxial wafers for semiconductor white light illumination will reach 314, and only 263 units in Asia will be sold. 350 million US dollars. In addition to other application markets, the market size of epitaxial furnaces in 2011 will be close to 1.5 billion US dollars. In 2015, the market size of epitaxial furnaces will be close to 3 billion US dollars. Technology determines the application and the market determines the investment behavior. The future market with explosive growth is triggering a new wave of investment. However, the epitaxial furnace market is currently in an unhealthy monopoly, which has interfered with and affected the healthy and rapid development of the industry.
At present, the main problem in the development of MOCVD equipment in China is the disconnection between R&D and industrialization, and the disconnection between equipment and technology. In response to these two problems, it is recommended that during the “Twelfth Five-Year Plan†period, in the aspect of equipment, the professional management and technical teams with industrialization operations as the mainstay and the enterprise management model of market-oriented investors will be introduced to meet the market demand in a few years. Leading the research and development of major equipment, providing OEM/ODM as the manufacturing model, providing the whole society with the research and development platform of the extension technology, forming the epitaxial technology and the epitaxial furnace design technology with independent intellectual property rights (core patents), ensuring the rolling development of the enterprise. The rooting and germination of the project will result in the realization of the project's benefits and the sustainable development of the enterprise. On the basis of the existing, bold breakthrough, aiming at the single-machine capacity of the mainstream market after three years, cultivating the extension of human resources on the epitaxial furnace with independent intellectual property rights, developing epitaxial technology, fundamentally guaranteeing the sustainable development of China's semiconductor lighting industry and improving The competitiveness of China's semiconductor lighting industry. (From "Semiconductor Lighting" magazine, 2010, Issue 4, edited by maysoong)
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